RKD Silicon Backside Prep System
Model

ULTRAPREP

Large Die Backside Thinning with 

Minimal Thickness Variation

 

Fast, easy setup, including alignment

NANOPREP

Die Backside Thinning and more...

 

 

Fast, easy setup, including alignment

Description
  • Simple operator interface with full process prgrammability

  • System automation of thinning and polishing processes

  • Programmable depth, accurate to +/- 1 microns

  • Removable sample holders- allow removal of samples without remounting or realignment.

  • Contour Tool Path for grinding, lapping, polishing.

  • Eliminates "Stair Stepping" Die cracking, Die levelling, die thickness variation.

  • Easy removal of heat spreaders, encapsulant, die attach pad

  • Available inexpensive tooling

  • Small footprint- takes minimal bench space

  • Simple operator interface with full process.

  • Programmability

  • System automation of thinning and polishing processes

  • Programmable depth, accurate to +/-5 microns

  • Removable sample holders- allow removal of samples without remounting or realignment.

  • Compliant Tool Pathway for: Grinding, Lapping, Polishing

  • Eliminates "stair stepping" Die cracking

  • Easy removal of heat spreaders, encapsulant, die attach pad

  • Available inexpensive tooling

  • Small footprint- takes minimal bench space  

Specifications
  • Machine size 375mm high, 375mm wide, 350mm deep

  • Weight: 30 Kg

  • Power requirements: 90 to 250 VAC , 49 to 61 Hertz at 4 amps maximum

  • X axis travel 60mm

  • Y axis travel 55mm

  • Z axis travel 55mm

  • Maximum speed: 500mm/minute

  • Resolution 5 microns in X and Y, 1 micron in Z

  • Positional accuracy +/-2.5 microns per millimeter of travel

  • Spindle axis accuracy +/-0.67 milli-radians normal to fixture plane

  • Z axis repeatability +/-2 microns

  • Maximum spindle speed 10,000 RPM

  • Tool holder special 3.18mm (0.125inch) shank tool holder (other shank diameters are available on request)

  • Number of media pumps 3; one to supply grinding lubricant, and two for delivering slurries for the lapping and polishing processes

  • Media pump flow rate 0.1 to 3.5ml per minute

  • Heated stage temp range 20 to 80 degrees C

  • Temperature accuracy +/-2 degrees C

  • Data logging included and accessible via RS 232 connection. Data output is comma delimited format for  comprehensive analysis, storage and retrieval as necessary. 

  • Machine size: 375mm high, 370mm wide, 330mm deep

  • Weight: 20 Kg

  • Power requirements: 90 to 250 VAC , 49 to 61 Hertz at 4 amps maximum

  • Interface 9 pin "D-sub" serial port to connect to hand-held controller

  • X axis travel 75mm

  • Y axis travel 75mm

  • Z axis travel 75mm (57mm with tool installed)

  • Maximum speed : 500 mm/minute

  • Resolution 5 microns in X and Y

  • Positional accuracy +/-2.5 microns per millimeter of travel

  • Spindle axis accuracy +/-0.67 milli-radians normal to fixture plane

  • Z axis repeatability +/-2 microns without re-zero

  • Maximum spindle speed 7,000 RPM

  • Tool holder special 3.18mm (0.125inch) shank tool holder (other shank diameters are available on request)

  • Tool preset Height: 17.78mm

 
Note: Technical specification subject to change without notice.